Products
Products
Advantages to
fabricaton facility
fabricaton facility
Japan has made a major shift toward revival in semiconductors’field.
With new Eco Brush, Grace the world will push the CMP cleaning accuracy to the world‘s most advanced level. By resolving the structural weaknesses of conventional brushes, it has become possible not only to increase detergency, but at the same time to significantly reduce the amount of pure water use andthe other waste. The revolution in CMP cleaning begins with this new Eco Brush.
TC-23 Eco Brush was born in Sacramento, USA. After repeated trial and error with the world's most advanced semiconductor process sites, it has now landed in Japan with great anticipation. The new Eco Brush has achieved a major innovation by reducing the amount of PVA use, which is a cause of organic matter contamination, to the absolute limit (-70% , the manufacturer's in-house research) and using resin material that does not elute metal contamination in the module frame and core.
This allows us to control the flow and distribution of pure water and provide cleanliness required by leading-adge processes.
With new Eco Brush, Grace the world will push the CMP cleaning accuracy to the world‘s most advanced level. By resolving the structural weaknesses of conventional brushes, it has become possible not only to increase detergency, but at the same time to significantly reduce the amount of pure water use andthe other waste. The revolution in CMP cleaning begins with this new Eco Brush.
TC-23 Eco Brush was born in Sacramento, USA. After repeated trial and error with the world's most advanced semiconductor process sites, it has now landed in Japan with great anticipation. The new Eco Brush has achieved a major innovation by reducing the amount of PVA use, which is a cause of organic matter contamination, to the absolute limit (-70% , the manufacturer's in-house research) and using resin material that does not elute metal contamination in the module frame and core.
This allows us to control the flow and distribution of pure water and provide cleanliness required by leading-adge processes.
Data
TC-23 Eco Brush improves cleaning accuracy and reduces pure water usage and PVA
waste at the same time
waste at the same time
Conventional brushes
①High PVA usage
②Constant ‘break in time’ required
③Difficult to control the distribution and flow path of pure water
④A lot of pure water flows between nodules
⑤Reasonable brush’s unit price
⑥Relatively large environmental impact such as pure water
consumption and PVA disposal
②Constant ‘break in time’ required
③Difficult to control the distribution and flow path of pure water
④A lot of pure water flows between nodules
⑤Reasonable brush’s unit price
⑥Relatively large environmental impact such as pure water
consumption and PVA disposal
TC-23 eco brush
①Significant reduction in PVA usage
②Significant reduction in ‘break in time’ length
③Evenly concentrated water flow at the tip of the nodule
④Significant reduction in pure water consumption
⑤The unit price of the brush is high, but also high in detergency
with longlife
⑥Less environmental impact and the total cost is similar or
less than conventional type
②Significant reduction in ‘break in time’ length
③Evenly concentrated water flow at the tip of the nodule
④Significant reduction in pure water consumption
⑤The unit price of the brush is high, but also high in detergency
with longlife
⑥Less environmental impact and the total cost is similar or
less than conventional type
PRECISE WATER CONTROL
-
●Structurally, water is discharged from the nodule tip
●Therefore, particles scraped up with nodules from the surface of WF are easily discharged from the tip of the nodule
●By controlling water leaking from the gaps between nodules and from the sides, water consumption can be reduced by more than 40%
(manufacturer's in-house research).
●Depending on the nodule shape, the particle catching capability and the purge force will change. We are able to propose designs according to
the customer’s needs.
TC-23 contributes to improved cleaning accuracy, cost reduction, and environmental issues.
This is Revolutionary cleaning tools to survive the intensifying semiconductor competition.
This is Revolutionary cleaning tools to survive the intensifying semiconductor competition.
